منابع مشابه
Spatially controllable chemical vapor deposition
Most conventional chemical vapor deposition (CVD) systems do not have the spatial actuation and sensing capabilities necessary to control deposition uniformity, or to intentionally induce nonuniform deposition patterns for single-wafer combinatorial CVD experiments. In an effort to address this limitation, a novel CVD reactor system has been developed that can explicitly control the spatial pro...
متن کاملVacancy Formation during Vapor Deposition
A hybrid modeling approach combining two-dimensional atomistic molecular dynamics simulations of vacancy formation with a continuum analysis of vacancy diffusion has been used to predict the vacancy content of vapor deposited nickel as a function of deposition rate/temperature and incident flux energy/angle. The hybrid approach uses a previously developed molecular dynamics technique to obtain ...
متن کاملPlasmon-assisted chemical vapor deposition.
We introduce a new chemical vapor deposition (CVD) process that can be used to selectively deposit materials of many different types. The technique makes use of the plasmon resonance in nanoscale metal structures to produce the local heating necessary to initiate deposition when illuminated by a focused low-power laser. We demonstrate the technique, which we refer to as plasmon-assisted CVD (PA...
متن کاملEvaluation of Vapor Deposition Techniques for Membrane Pore Size Modification
The suitability of three vapor deposition techniques for pore size modification was evaluated using polycarbonate track etched membranes as model supports. A feature scale model was employed to predict the pore geometry after modification and the resulting pure water flux. Physical vapor deposition (PVD) and pulsed plasma-enhanced chemical vapor deposition (PECVD), naturally, form asymmetric na...
متن کاملChemical Vapor Deposition of Antimicrobial Polymer Coatings
There is large and growing interest in making a wide variety of materials and surfaces antimicrobial. Initiated chemical vapor deposition (iCVD), a solventless lowtemperature process, is used to form thin films of polymers on fragile substrates. To improve research efficiency, a new combinatorial iCVD system was fabricated and used to efficiently determine the deposition kinetics for two new po...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Journal of the Illuminating Engineering Institute of Japan
سال: 1991
ISSN: 0019-2341,1349-838X,2185-1506
DOI: 10.2150/jieij1980.75.appendix_235